Atomic discreteness and the nature of structural equilibrium in conductance histograms of electromigrated Cu-nanocontacts

TL;DR

This study analyzes conductance histograms of electromigrated copper nanocontacts, revealing atomic-level structural influences and crystallographic directions through Fourier analysis, and suggesting defect-related electromigration effects.

Contribution

It demonstrates that conductance histogram peaks correspond to atomic structures and crystallographic directions, providing insight into atomic discreteness in nanocontacts.

Findings

Fourier transform peaks match fcc-Cu crystallographic directions

Additional frequencies suggest oxidation and hcp-Cu formation

Electromigration may be enhanced by defects even at low temperatures

Abstract

We investigate the histograms of conductance values obtained during controlled electromigration thinning of Cu thin films. We focus on the question whether the most frequently observed conductance values, apparent as peaks in conductance histograms, can be attributed to the atomic structure of the wire. To this end we calculate the Fourier transform of the conductance histograms. We find all the frequencies matching the highly symmetric crystallographic directions of fcc-Cu. In addition, there are other frequencies explainable by oxidation and possibly formation of hcp-Cu. With these structures we can explain all peaks occurring in the Fourier transform within the relevant range. The results remain the same if only a third of the samples are included. By comparing our results to the ones available in the literature on work-hardened nanowires we find indications that even at low temperatures of the environment, metallic nanocontacts could show enhanced electromigration at low current densities due to defects enhancing electron scattering.