Ultra-Stretchable Interconnects for High-Density Stretchable Electronics
Salman Shafqat, Johan P. M. Hoefnagels, Angel Savov, Shivani Joshi,, Ronald Dekker, Marc G. D. Geers

TL;DR
This paper presents CMOS-compatible, ultra-stretchable interconnects with micron-scale footprints, enabling high-density stretchable electronics through innovative 3D microfabrication techniques that achieve over 2000% elastic stretch.
Contribution
Introduction of a CMOS-enabled, free-standing, miniaturized interconnect structure leveraging 3D kinematic mechanisms for extreme stretchability in high-density electronics.
Findings
Elastic stretch beyond 2000% with <0.3% resistance change
Ultimate stretch beyond 3000% with <1% resistance change
Over 10 million cycles at 1000% stretch with stable resistance
Abstract
The exciting field of stretchable electronics (SE) promises numerous novel applications, particularly in-body and medical diagnostics devices. However, future advanced SE miniature devices will require high-density, extremely stretchable interconnects with micron-scale footprints, which calls for proven standardized (complementary metal-oxide semiconductor (CMOS)-type) process recipes using bulk integrated circuit (IC) microfabrication tools and fine-pitch photolithography patterning. Here, we address this combined challenge of microfabrication with extreme stretchability for high-density SE devices by introducing CMOS-enabled, free-standing, miniaturized interconnect structures that fully exploit their 3D kinematic freedom through an interplay of buckling, torsion, and bending to maximize stretchability. Integration with standard CMOS-type batch processing is assured by utilizing the…
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