Transport properties of the top and bottom surfaces in monolayer MoS2 grown by chemical vapor deposition
Sora Kurabayashi, and Kosuke Nagashio

TL;DR
This study investigates the interaction between monolayer MoS2 and substrates, revealing that the crystallinity of MoS2 surfaces can be preserved and improved, which is promising for electronic applications.
Contribution
It introduces a polymer-transfer technique to selectively transfer and analyze the top and bottom surfaces of CVD-grown MoS2, demonstrating high crystallinity on both surfaces.
Findings
Doping and strain from substrates can be removed by transfer.
Crystallinity of the bottom surface is similar to the top surface.
High crystallinity suggests potential for improved growth conditions.
Abstract
The advantage of MoS2, compared with graphene, is the direct growth on various oxide substrates by chemical vapor deposition (CVD) without utilizing catalytic metal substrates, which facilitates practical applications for electronics. The carrier mobility is, however, degraded from the intrinsic limit mainly due to short-range scattering caused by S vacancies formed during CVD growth. If the upper limit for the crystallinity of CVD-MoS2 on oxide substrates is determined by the MoS2/substrate interaction during growth, it will hinder the advantage. In this study, we investigated the interaction between monolayer MoS2 and a SiO2/Si substrate and the difference in crystallinity between the top and bottom S surfaces due to the MoS2/substrate interaction. Raman and photoluminescence spectroscopy indicated that doping and strain were induced in MoS2 from the substrate, but they could be…
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