Influence of substrate on structural and transport properties of LaNiO3 thin films prepared by pulsed laser deposition
L. Cichetto Jr, S. Sergeenkov, J.C.C.A. Diaz, E. Longo, and F. M., Araujo-Moreira

TL;DR
This study investigates how substrate choice, film thickness, and grain size influence the structural and electrical properties of LaNiO3 thin films prepared by pulsed laser deposition, emphasizing optimization of growth parameters.
Contribution
It provides a systematic analysis of substrate effects and growth conditions on LaNiO3 thin films' quality and properties, which was not comprehensively explored before.
Findings
Optimal substrates yield well-textured, high-quality films.
Growth parameters significantly affect film crystallinity.
Substrate orientation influences transport properties.
Abstract
We report the structural and transport properties of LaNiO3 thin films prepared by pulsed laser deposition technique. To understand the effects of film thickness, lattice mismatch and grain size on transport properties, various oriented substrates were used for deposition, including single-crystalline SrLaAlO4 (001), SrTiO3 (100) and LaAlO3 (100). To achieve a high quality LaNiO3 thin films, the vital parameters (such as laser fluence, substrate temperature, oxygen pressure, and deposition time) were optimized. The best quality films are found to be well textured samples with good crystalline properties.
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