Femtosecond pulsed laser micro-machining of glass substrates with application to microfluidic devices
M.S. Giridhar, Kibyung Seong, Axel Sch\"ulzgen, Pramod Khulbe, Nasser, Peyghambarian, and Masud Mansuripur

TL;DR
This paper presents a femtosecond laser micro-machining technique for precise, localized glass processing, enabling the fabrication of microfluidic devices with sealed channels and sub-surface features.
Contribution
It introduces a novel femtosecond laser method for drilling and sealing microfluidic structures in glass, improving precision and functionality over traditional lithography.
Findings
Able to drill sub-surface tunnels in glass
Fabricated sealed microfluidic channels
Localized ablation with minimal substrate damage
Abstract
We describe a technique for surface and sub-surface micro-machining of glass substrates using tightly focused femtosecond laser pulses at a wavelength of 1660 nm. Although silicate glass is normally transparent at this wavelength, the extremely high intensity of the focused beam causes multi-photon absorption, resulting in localized ablation of the glass substrate. Ablation is strictly confined to the vicinity of focus, leaving the rest of the substrate unaffected. We exploit this phenomenon to drill a micro-hole through a thin vertical wall that separates two adjacent pits machined by the same laser in a glass plate. A salient feature of pulsed laser micro-machining, therefore, is its ability to drill sub-surface tunnels and canals into glass substrates, a process that requires multiple steps in standard lithography. To demonstrate a potential application of this micro-machining…
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