Electrical transport and optical band gap of NiFe$_\textrm{2}$O$_\textrm{x}$ thin films
Panagiota Bougiatioti, Orestis Manos, Christoph Klewe, Daniel Meier,, Niclas Teichert, Jan-Michael Schmalhorst, Timo Kuschel, G\"unter Reiss

TL;DR
This study investigates how varying oxygen content in NiFe₂Oₓ thin films affects their electrical and optical properties, revealing controllable transport mechanisms and band gaps suitable for spintronic applications.
Contribution
It demonstrates the fabrication of NiFe₂Oₓ films with tunable properties through oxygen partial pressure control, linking structural, electrical, and optical characteristics.
Findings
Lower oxidation increases electrical conductivity and reduces band gap.
Films exhibit mixed-type semiconducting behavior.
Transport mechanisms vary with temperature and oxygen content.
Abstract
We fabricated NiFeO thin films on MgAlO(001) substrates by reactive dc magnetron co-sputtering varying the oxygen partial pressure during deposition. The fabrication of a variable material with oxygen deficiency leads to controllable electrical and optical properties which would be beneficial for the investigations of the transport phenomena and would, therefore, promote the use of such materials in spintronic and spin caloritronic applications. We used several characterization techniques in order to investigate the film properties, focusing on their structural, magnetic, electrical, and optical properties. From the electrical resistivity measurements we obtained the conduction mechanisms that govern the systems in high and low temperature regimes, extracting low thermal activation energies which unveil extrinsic transport mechanisms. The thermal…
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