On the convergence to critical scaling profiles in submonolayer deposition models
Fernando P. da Costa, Jo\~ao T. Pinto, Rafael Sasportes

TL;DR
This paper investigates the rate at which solutions of a mean field model for submonolayer atom deposition converge to critical scaling profiles, focusing on an inner expansion near a critical direction and establishing convergence and rate results.
Contribution
It introduces a new similarity variable for analyzing convergence to critical profiles and proves convergence and rate results in a mean field deposition model.
Findings
Proves convergence of solutions to a specific similarity profile
Establishes the rate at which the convergence occurs
Analyzes the inner expansion near the critical direction
Abstract
In this work we study the rate of convergence to similarity profiles in a mean field model for the deposition of a submonolayer of atoms in a crystal facet, when there is a critical minimal size for the stability of the formed clusters. The work complements recently published related results by the same authors in which the rate of convergence was studied outside of a critical direction in the cluster size vs. time plane. In this paper we consider a different similarity variable, , corresponding to an inner expansion of that critical direction, and prove the convergence of solutions to a similarity profile when with fixed, as well as the rate at which the limit is approached.
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Taxonomy
Topicsnanoparticles nucleation surface interactions · Stochastic processes and statistical mechanics · Material Dynamics and Properties
