Ultrafast Epitaxial Growth of Metre-Sized Single-Crystal Graphene on Industrial Cu Foil
Xiaozhi Xu, Zhihong Zhang, Jichen Dong, Ding Yi, Jingjing Niu, Muhong, Wu, Li Lin, Rongkang Yin, Mingqiang Li, Jingyuan Zhou, Shaoxin Wang, Junliang, Sun, Xiaojie Duan, Peng Gao, Ying Jiang, Xiaosong Wu, Hailin Peng, Rodney S., Ruoff, Zhongfan Liu, Dapeng Yu, Enge Wang

TL;DR
This paper reports a rapid method to grow large, high-quality single-crystal graphene on industrial copper foil, enabling scalable production for advanced electronic applications.
Contribution
The authors developed an ultrafast, scalable process for epitaxial growth of metre-sized single-crystal graphene on industrial copper foil using a novel temperature-driven annealing technique.
Findings
Graphene film of 5 x 50 cm2 was grown in 20 minutes.
The graphene exhibited high mobility (~23,000 cm2V-1s-1) and low sheet resistance (~230 ohm/square).
The process produces high-quality, nearly misorientation-free single-crystal graphene.
Abstract
A foundation of the modern technology that uses single-crystal silicon has been the growth of high-quality single-crystal Si ingots with diameters up to 12 inches or larger. For many applications of graphene, large-area high-quality (ideally of single-crystal) material will be enabling. Since the first growth on copper foil a decade ago, inch-sized single-crystal graphene has been achieved. We present here the growth, in 20 minutes, of a graphene film of 5 x 50 cm2 dimension with > 99% ultra-highly oriented grains. This growth was achieved by: (i) synthesis of sub-metre-sized single-crystal Cu(111) foil as substrate; (ii) epitaxial growth of graphene islands on the Cu(111) surface; (iii) seamless merging of such graphene islands into a graphene film with high single crystallinity and (iv) the ultrafast growth of graphene film. These achievements were realized by a temperature-driven…
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Taxonomy
TopicsGraphene research and applications
