Absence of a Band Gap at Interface of a Metal and Highly Doped Monolayer $MoS_2$
Alexander Kerelsky, Ankur Nipane, Drew Edelberg, Dennis Wang, Xiaodong, Zhou, Abdollah Motmaendadgar, Hui Gao, Saien Xie, Kibum Kang, Jiwoong Park,, James Teherani, Abhay Pasupathy

TL;DR
This study uses ultra-high vacuum scanning tunneling microscopy to reveal that metal-induced gap states dominate the electronic properties at the interface of heavily doped monolayer MoS2, setting fundamental limits for electrical contact quality.
Contribution
It provides the first atomic-scale measurements of the energy band diagram at metal-doped MoS2 interfaces, revealing universal metal-induced gap states that influence contact behavior.
Findings
MIGS dominate the electronic properties at the interface.
Measured gap in local density of states extends up to 2 nm from the interface.
Decay lengths of MIGS are similar across different metals, indicating universality.
Abstract
High quality electrical contact to semiconducting transition metal dichalcogenides (TMDCs) such as is key to unlocking their unique electronic and optoelectronic properties for fundamental research and device applications. Despite extensive experimental and theoretical efforts reliable ohmic contact to doped TMDCs remains elusive and would benefit from a better understanding of the underlying physics of the metal-TMDC interface. Here we present measurements of the atomic-scale energy band diagram of junctions between various metals and heavily doped monolayer using ultra-high vacuum scanning tunneling microscopy (UHV-STM). Our measurements reveal that the electronic properties of these junctions are dominated by 2D metal induced gap states (MIGS). These MIGS are characterized by a spatially growing measured gap in the local density of states (L-DOS) of the within…
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