Fractal analysis of BaF2 thin films deposited on different substrates

TL;DR

This study investigates how substrate material influences the structural, surface, and fractal properties of BaF2 thin films prepared by electron beam evaporation, revealing substrate-dependent variations in grain size, roughness, and fractal dimension.

Contribution

It introduces the application of Higuchi's fractal analysis to AFM images of BaF2 thin films on different substrates, highlighting substrate effects on fractal dimensions.

Findings

Fractal dimension varies with substrate type.

Surface roughness and grain size depend on substrate material.

Fractal analysis provides insights into surface morphology differences.

Abstract

Barrium fluoride (BaF2) thin films were prepared by electron beam evaporation technique at room temperature, on glass, Silicon and Aluminum substrates having thickness of 20 nm each. Its structural property and surface morphology were studied using glancing angle X-ray diffraction (GAXRD) and atomic force microscopy (AFM) respectively. It was found that grain size, average surface roughness and interface width changes with different substrates. Higuchi algorithm is applied for the fractal measure on AFM images.It was observed found that the fractal dimension varied from substrate to substrate.