Highly hydrogen-sensitive thermal desorption spectroscopy system for quantitative analysis of low hydrogen concentration (~1 x 10^16 atoms/cm3) in thin-film samples
Taku Hanna, Hidenori Hiramatsu, Isao Sakaguchi, Hideo Hosono

TL;DR
The paper introduces a highly sensitive thermal desorption spectroscopy system capable of detecting extremely low hydrogen concentrations in thin films, surpassing existing methods in sensitivity and quantitative accuracy.
Contribution
A novel HHS-TDS system was developed with ultra-high vacuum and specialized materials, achieving 2000 times higher sensitivity than commercial systems for low hydrogen detection.
Findings
Achieved hydrogen detection limit of ~1 x 10^16 atoms/cm3.
Demonstrated quantitative analysis of thin films with low hydrogen content.
Surpassed sensitivity of SIMS and R-NRA methods.
Abstract
We developed a highly hydrogen-sensitive thermal desorption spectroscopy (HHS-TDS) system to detect and quantitatively analyze low hydrogen concentrations in thin films. The system was connected to an in situ sample-transfer chamber system, manipulators, and an rf magnetron sputtering thin-film deposition chamber under an ultra-high-vacuum (UHV) atmosphere of ~10^-8 Pa. The following key requirements were proposed in developing the HHS-TDS: (i) a low hydrogen residual partial pressure, (ii) a low hydrogen exhaust velocity, and (iii) minimization of hydrogen thermal desorption except from the bulk region of the thin films. To satisfy these requirements, appropriate materials and components were selected, and the system was constructed to extract the maximum performance from each component. Consequently, ~2000 times higher sensitivity to hydrogen than that of a commercially available…
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