Growth of AlGaN under the conditions of significant gallium evaporation: phase separation and enhanced lateral growth
I.O. Mayboroda, A.A. Knizhnik, Yu.V. Grishchenko, I. S. Ezubchenko,, Maxim L. Zanaveskin, M. Yu. Presniakov, B.V. Potapkin, V.A. Ilyin

TL;DR
This study investigates AlGaN growth under high gallium evaporation conditions, revealing phase separation and enhanced lateral growth due to Ga accumulation at surface defects, supported by experimental data and theoretical modeling.
Contribution
It introduces a kinetic model for AlGaN growth with significant Ga desorption and combines experimental and first-principles calculations to analyze Ga atom binding energies.
Findings
Gallium addition improves film morphology compared to pure AlN.
Larger Ga amounts are retained at surface defect boundaries during desorption.
The binding energy difference of Ga atoms at defects vs. terraces is approximately 0.3 eV.
Abstract
Growth kinetics of AlGaN in NH3 MBE under significant Ga desorption was studied. It was found that the addition of gallium stimulates 2D growth and provides better morphology of films compared to pure AlN. The effect was experimentally observed at up to 98% desorption of the impinging gallium. We found that, under the conditions of significant thermal desorption, larger amounts of gallium were retained at lateral boundaries of 3D surface features than at flat terraces because of the higher binding energy of Ga atoms at specific surface defects. The selective accumulation of gallium resulted in an increase in lateral growth component through the formation of the Ga-enriched AlGaN phase at boundaries of 3D surface features. We studied temperature dependence of AlGaN growth rate and developed a kinetic model analytically describing this dependence. As the model was in good agreement with…
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