Thermally activated processes of the phase composition and structure formation of the nanoscaled Co-Sb films

TL;DR

This study investigates how the phase composition and structure of nanoscale Co-Sb films evolve during thermal treatment, revealing sublimation effects and phase formation sequences relevant for material applications.

Contribution

It provides new insights into the thermal stability and phase evolution of nanoscaled Co-Sb films deposited by molecular-beam epitaxy.

Findings

Films are initially polycrystalline without texture.

Phase composition follows the bulk Co-Sb phase diagram.

Sublimation occurs above 450-500°C during vacuum annealing.

Abstract

It is investigated the formation of the phase composition and structure in the nanoscaled CoSbx (30 nm) films deposited by the method of molecular-beam epitaxy on the substrates of the oxidated monocrystalline silicon at 200 C and following thermal treatment in vacuum in temperature range of 300-700 C. It is established that the films after the deposition are polycrystalline without texture. With increase in Sb content the formation of the phase composition in the films takes place in such sequence as this is provided by phase diagram for the bulky state of the Co-Sb system. At annealing in vacuum at temperature above 450-500 C a sublimation not only of the crystalline Sb phase but from the antimonides occurs.