Experimental detection of active defects in few layers MoS2 through random telegraphic signals analysis observed in its FET characteristics
Nan Fang, Kosuke Nagashio, Akira Toriumi

TL;DR
This study systematically analyzes random telegraphic signals in MoS2 FETs to detect and understand active defects, especially sulfur vacancies, which impact device stability and performance.
Contribution
It introduces a comprehensive RTS analysis method for atomically thin MoS2 FETs, revealing defect types, interactions, and defect locations through local irradiation experiments.
Findings
Identification of various RTS types in MoS2 FETs.
Correlation between RTSs and defect interactions.
Defect localization via multi-probe and irradiation techniques.
Abstract
Transition-metal dichalcogenides (TMDs), such as molybdenum disulfide (MoS2), are expected to be promising for next generation device applications. The existence of sulfur vacancies formed in MoS2, however, will potentially make devices unstable and problematic. Random telegraphic signals (RTSs) have often been studied in small area Si metal-oxide-semiconductor field-effect transistors (MOSFETs) to identify the carrier capture and emission processes at defects. In this paper, we have systemically analyzed RTSs observed in atomically thin layer MoS2 FETs. Several types of RTSs have been analyzed. One is the simple on/off type of telegraphic signals, the second is multilevel telegraphic signals with a superposition of the simple signals, and the third is multilevel telegraphic signals that are correlated with each other. The last one is discussed from the viewpoint of the defect-defect…
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