Insight into the Role of Oxygen in Phase-Change Material GeTe
Linggang Zhu, Zhen Li, Jian Zhou, Naihua Miao, Zhimei Sun

TL;DR
This study reveals how oxygen atoms influence the atomic structure, electrical properties, and phase transition behavior of GeTe, a key material in phase-change memory, through detailed ab initio simulations.
Contribution
It uncovers the atomic-scale defect mechanisms caused by oxygen doping in GeTe, explaining improved data retention and altered electrical properties.
Findings
Oxygen forms a 'dumbbell-like' defect with Ge and Te near vacancies.
Oxygen doping increases resistivity by raising carrier effective mass.
The defect mechanism explains enhanced data retention in oxygen-doped GeTe.
Abstract
Oxygen is widely used to tune the performance of chalcogenide phase-change materials in the usage of phase-Change random access memory (PCRAM) which is considered as the most promising next-generation non-volatile memory. However, the microscopic role of oxygen in the write-erase process, i.e., the reversible phase transition between crystalline and amorphous state of phase-change materials is not clear yet. Using oxygen doped GeTe as an example, this work unravels the role of oxygen at the atomic scale by means of ab initio total energy calculations and ab initio molecular dynamics simulations. Our main finding is that after the amorphization and the subsequent re-crystallization process simulated by ab initio molecular dynamics, oxygen will drag one Ge atom out of its lattice site and both atoms stay in the interstitial region near the Te vacancy that was originally occupied by the…
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Taxonomy
TopicsPhase-change materials and chalcogenides · Chalcogenide Semiconductor Thin Films · Transition Metal Oxide Nanomaterials
