Giant magnetoresistance in electrodeposited Co-Cu/Cu multilayers: origin of absence of oscillatory behaviour
I. Bakonyi, E. Simon, B.G. T\'oth, L. P\'eter, L.F. Kiss

TL;DR
This study investigates the magnetoresistance in electrodeposited Co-Cu/Cu multilayers, revealing the absence of antiferromagnetic coupling and attributing large GMR effects to superparamagnetic regions rather than AF coupling.
Contribution
It provides detailed insights into the microstructural origins of GMR in electrodeposited multilayers, challenging the assumption of AF coupling as the primary cause.
Findings
GMR increases with Cu layer thickness up to 4 nm
No evidence of antiferromagnetic coupling between layers
Large GMR attributed to superparamagnetic regions
Abstract
A detailed study of the evolution of the magnetoresistance was performed on electrodeposited Co/Cu multilayers with Cu layer thicknesses ranging from 0.5 nm to 4.5 nm. For thin Cu layers (up to 1.5 nm), anisotropic magnetoresistance (AMR) was observed whereas multilayers with thicker Cu layers exhibited clear giant magnetoresistance (GMR) behaviour. The GMR magnitude increased up to about 3.5 to 4 nm Cu layer thickness and slightly decreased afterwards. According to magnetic measurements, all samples exhibited ferromagnetic (FM) behaviour. The relative remanence turned out to be about 0.75 for both AMR and GMR type multilayers. This clearly indicates the absence of an antiferromagnetic (AF) coupling between adjacent magnetic layers for Cu layers even above 1.5 nm where the GMR effect occurs. The AMR behaviour at low spacer thicknesses indicates the presence of strong FM coupling (due…
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