Second-harmonic generation as probe for structural and electronic properties of buried GaP/Si(001) interfaces
K. Brixius (1), A. Beyer (1), J. G\"udde (1), M. D\"urr (2), W. Stolz, (1), K. Volz (1), U. H\"ofer (1) ((1) Fachbereich Physik und Zentrum f\"ur, Materialwissenschaften, Philipps-Universit\"at (2) Institut f\"ur Angewandte, Physik, Justus-Liebig-Universit\"at Gie{\ss}en)

TL;DR
This paper demonstrates that optical second-harmonic generation can effectively probe the buried GaP/Si(001) interface, revealing interface quality and defects through polarization-dependent anisotropy measurements, useful for in-situ monitoring.
Contribution
It introduces SHG as a non-invasive, in-situ optical technique to assess interface quality and detect defects like anti-phase domains and twins in GaP/Si interfaces.
Findings
Strong isotropic SHG component indicates interface quality.
SHG anisotropy correlates with atomic-scale interface features.
Technique enables in-situ monitoring during growth.
Abstract
Optical second-harmonic generation is demonstrated to be a sensitive probe of the buried interface between the lattice matched semiconductors gallium phosphide and silicon with (001) orientation. Rotational anisotropy measurements of SHG from GaP/Si show a strong isotropic component of the response not present for pure Si(001) or GaP(001). The strength of the overlaying anisotropic response directly correlates with the quality of the interface as determined by atomically resolved scanning transmission electron microscopy.Optical second-harmonic generation is demonstrated to be a sensitive probe of the buried interface between the lattice matched semiconductors gallium phosphide and silicon with (001) orientation. Rotational anisotropy measurements of SHG from GaP/Si show a strong isotropic component of the response not present for pure Si(001) or GaP(001). The strength of the overlaying…
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