Development of Yttrium alloy ion source and its application in nanofabrication
Nadezhda Kukharchyk, Ronna Neumann, Swetlana Mazarov, Pavel Bushev,, Andreas Wieck, Paul Mazarov
TL;DR
This paper introduces a novel yttrium alloy ion source for focused ion beam applications, demonstrating high emission currents and exploring its effects on optical properties in nanofabrication processes.
Contribution
The development of a YAuSi Liquid Metal Alloy Ion Source with high emission current and potential for advanced nanofabrication techniques.
Findings
High emission current of triple-charged yttrium ions
Similar working parameters to other gold-silicon LMAIS
Yttrium implantation affects luminescence of co-implanted erbium ions
Abstract
We present a new YAuSi Liquid Metal Alloy Ion Source (LMAIS), generating focused ion beams of yttrium ions, and its prospective applications for nanofabrication, sample preparation, lithographic and implantation processes. Working parameters of the AuSiY LMAIS are similar to other gold-silicon based LMAIS. We found anomalously high emission current of triple charged Yttrium ions. Influence of Yttrium implantation on optical qualities of the implanted ion-ensembles is shown in luminescence of co-implanted Erbium ions.
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