Cryogenic Characterization of FBK HD Near-UV Sensitive SiPMs

TL;DR

This paper presents a detailed cryogenic characterization of FBK's near-ultraviolet high-density SiPMs, demonstrating their low noise operation below 100 K, which is promising for future cryogenic particle detectors.

Contribution

It provides the first comprehensive cryogenic performance data of FBK HD near-UV SiPMs, including noise behavior and operational parameters down to 40 K.

Findings

Dark rate below 0.01 cps/mm² at <100 K

Correlated noise probability below 35% at 6 V over-voltage

Noise parameters vary up to 7 orders of magnitude between 300 K and 40 K

Abstract

We report on the characterization of near-ultraviolet high density silicon photomultiplier (\SiPM) developed at Fondazione Bruno Kessler (\FBK) at cryogenic temperature. A dedicated setup was built to measure the primary dark noise and correlated noise of the \SiPMs\ between 40 and 300~K. Moreover, an analysis program and data acquisition system were developed to allow the precise characterization of these parameters, some of which can vary up to 7 orders of magnitude between room temperature and 40~K. We demonstrate that it is possible to operate the \FBK\ near-ultraviolet high density \SiPMs\ at temperatures lower than 100~K with a dark rate below 0.01 cps/mm$^2$ and total correlated noise probability below 35\% at an over-voltage of 6~V. These results are relevant for the development of future cryogenic particle detectors using \SiPMs\ as photosensors.