Interlayer Transport through a Graphene / Rotated-Boron-Nitride / Graphene Heterostructure
Supeng Ge, K. M. Masum Habib, Amrit De, Yafis Barlas, Darshana, Wickramaratne, Mahesh R. Neupane, Roger K. Lake

TL;DR
This paper investigates how the misorientation angle in a graphene/h-BN/graphene heterostructure affects interlayer electron transport, revealing different mechanisms in small and large angles through theoretical models.
Contribution
It introduces a comparative analysis of transport mechanisms in heterostructures at varying angles using two models, highlighting the role of Umklapp processes at small angles and bandgap effects at large angles.
Findings
Resistance increases with angle, peaking at 30°.
Umklapp processes create non-monotonic resistance features at small angles.
High bias induces additional current peaks due to Umklapp processes.
Abstract
Interlayer electron transport through a graphene / hexagonal boron-nitride (h-BN) / graphene heterostructure is strongly affected by the misorientation angle of the h-BN with respect to the graphene layers with different physical mechanisms governing the transport in different regimes of angle, Fermi level, and bias. The different mechanisms and their resulting signatures in resistance and current are analyzed using two different models, a tight-binding, non-equilibrium Green function model and an effective continuum model, and the qualitative features resulting from the two different models compare well. In the large-angle regime (), the change in the effective h-BN bandgap seen by an electron at the point of the graphene causes the resistance to monotonically increase with angle by several orders of magnitude reaching a maximum at . It…
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