Characterization of Three-Dimensional Microstructures in Single Crystal Diamond

TL;DR

This paper presents a method for creating three-dimensional microstructures in single crystal diamond using ion implantation and FIB, and characterizes the residual damage post-fabrication with Raman and photoluminescence techniques.

Contribution

It introduces a novel fabrication process combining ion implantation and FIB for diamond microstructures, with detailed damage characterization and mitigation through annealing.

Findings

Residual damage is effectively reduced after thermal annealing.

The process enables high-quality microstructure fabrication in single crystal diamond.

Microstructures have potential applications in quantum optics and optomechanics.

Abstract

We report on the Raman and photoluminescence characterization of three-dimensional microstructures created in single crystal diamond with a Focused Ion Beam (FIB) assisted lift-off technique. The method is based on MeV ion implantation to create a buried etchable layer, followed by FIB patterning and selective etching. In the applications of such microstructures where the properties of high quality single crystal diamond are most relevant, residual damage after the fabrication process represents a critical technological issue. The results of Raman and photoluminescence characterization indicate that the partial distortion of the sp3-bonded lattice and the formation of isolated point defects are effectively removed after thermal annealing, leaving low amounts of residual damage in the final structures. Three-dimensional microstructures in single-crystal diamond offer a large range of applications, such as quantum optics devices and fully integrated opto mechanical assemblies.