H2 O incorporation in the phosphorene/a-SiO2 interface: A first-principles study
Wanderla L. Scopel, Everson S. Souza, R. H. Miwa

TL;DR
This study uses first-principles calculations to analyze the stability and electronic properties of phosphorene on amorphous SiO2, focusing on water incorporation effects at the interface, revealing charge puddles and chemical bond formations.
Contribution
It provides new insights into water's role at the phosphorene/SiO2 interface, including hydroxyl and P--O--Si bond formation, based on first-principles modeling.
Findings
Phosphorene bonds via van der Waals interactions on amorphous SiO2.
Type-I band alignment with charge puddles influenced by oxygen vacancies.
Water incorporation leads to hydroxyl groups and stable P--O--Si bonds.
Abstract
Based on first-principles calculations, we investigate the energetic stability and the electronic properties of (i) a single layer phosphorene (SLP) adsorbed on the amorphous sio2 surface (SLP/a-sio2), and (ii) the further incorporation of water molecules at the phosphorene/a-sio2 interface. In (i), we find that the phosphorene sheet bonds to a-sio2 through van der Waals interactions, even upon the presence of oxygen vacancy on the surface. The \slp/a-\sio\ system presents a type-I band alignment, with the valence (conduction) band maximum (minimum) of the phosphorene lying within the energy gap of the a-\sio\ substrate. The structural, and the surface-potential corrugations promote the formation of electron-rich and -poor regions on the phosphorene sheet and at the SLP/a-sio2 interface. Such charge density puddles have been strengthened by the presence of oxygen vacancies in a-sio2. In…
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