An ab initio investigation of Bi$_2$Se$_3$ topological insulator deposited on amorphous SiO$_2$
I.S.S. de Oliveira, W.L. Scopel, R.H. Miwa

TL;DR
This study uses first-principles simulations to explore how Bi$_2$Se$_3$ topological insulator thin films interact with amorphous SiO$_2$, revealing effects on topological states, degeneracy breaking, and the influence of oxygen vacancies.
Contribution
It provides new insights into the topological properties of Bi$_2$Se$_3$ on amorphous SiO$_2$, including degeneracy breaking mechanisms and the role of oxygen vacancies, based on ab initio calculations.
Findings
Topological surface states remain present on a-SiO$_2$ substrate.
Degeneracy between Dirac cones is broken by substrate interaction.
Oxygen vacancies increase energy splitting between Dirac cones.
Abstract
We use first-principles simulations to investigate the topological properties of BiSe thin films deposited on amorphous SiO2, BiSe/a-SiO, which is a promising substrate for topological insulator (TI) based device applications. The BiSe films are bonded to a-SiO mediated by van der Waals interactions. Upon interaction with the substrate, the BiSe topological surface and interface states remain present, however the degeneracy between the Dirac-like cones is broken. The energy separation between the two Dirac-like cones increases with the number of BiSe quintuple layers (QLs) deposited on the substrate. Such a degeneracy breaking is caused by (i) charge transfer from the TI to the substrate and charge redistribution along the BiSe QLs, and (ii) by deformation of the QL in contact with the a-SiO substrate. We also investigate the…
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