Unusually High and Anisotropic Thermal Conductivity in Amorphous Silicon Nanostructures
Soonshin Kwon, Jianlin Zheng, Matthew C. Wingert, Shuang Cui, Renkun, Chen

TL;DR
This study reveals unexpectedly high and anisotropic in-plane thermal conductivity in amorphous silicon nanostructures, challenging previous assumptions and providing insights into vibrational mode propagation in disordered materials.
Contribution
The paper introduces novel a-Si nanostructures enabling precise in-plane thermal conductivity measurements and uncovers broad propagating vibrational mode mean free paths from 10 nm to 10 um.
Findings
In-plane k reaches ~3.0 W/m-K at 100 nm thickness.
In-plane k reaches ~5.3 W/m-K at 1.7 um thickness.
In-plane k is significantly higher than cross-plane k in the same films.
Abstract
Amorphous Si (a-Si) nanostructures are ubiquitous in numerous electronic and optoelectronic devices. Amorphous materials are considered to possess the lower limit to the thermal conductivity (k), which is ~1 W/m-K for a-Si. However, recent work suggested that k of micro-thick a-Si films can be greater than 3 W/m-K, which is contributed by propagating vibrational modes, referred to as "propagons". However, precise determination of k in a-Si has been elusive. Here, we used novel structures of a-Si nanotubes and suspended a-Si films that enabled precise in-plane k measurement within a wide thickness range of 5 nm to 1.7 um. We showed unexpectedly high in plane k in a-Si nanostructures, reaching ~3.0 and 5.3 W/m-K at 100 nm and 1.7 um, respectively. Furthermore, the measured in plane k is significantly higher than the cross-plane k on the same films. This usually high and anisotropic k in…
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Taxonomy
TopicsThin-Film Transistor Technologies · Semiconductor materials and interfaces · Force Microscopy Techniques and Applications
