Computing Maximum Flow with Augmenting Electrical Flows

TL;DR

This paper introduces a simpler, primal-dual maximum flow algorithm using electrical flows that improves running time for sparse graphs with large capacities, matching or surpassing previous methods.

Contribution

A novel, simpler primal-dual maximum flow algorithm leveraging electrical flows, improving efficiency over prior interior-point based methods.

Findings

Achieves $ ilde{O}(m^{10/7} U^{1/7})$ running time for maximum flow.

Simplifies the algorithmic framework compared to previous interior-point methods.

Provides similar improvements for maximum bipartite $b$-matching.

Abstract

We present an $\tilde{O}\left(m^{\frac{10}{7}}U^{\frac{1}{7}}\right)$-time algorithm for the maximum $s$-$t$ flow problem and the minimum $s$-$t$ cut problem in directed graphs with $m$ arcs and largest integer capacity $U$. This matches the running time of the $\tilde{O}\left((mU)^{\frac{10}{7}}\right)$-time algorithm of M\k{a}dry (FOCS 2013) in the unit-capacity case, and improves over it, as well as over the $\tilde{O}\left(m \sqrt{n} \log U\right)$-time algorithm of Lee and Sidford (FOCS 2014), whenever $U$ is moderately large and the graph is sufficiently sparse. By well-known reductions, this also gives similar running time improvements for the maximum-cardinality bipartite $b$-matching problem. One of the advantages of our algorithm is that it is significantly simpler than the ones presented in Madry (FOCS 2013) and Lee and Sidford (FOCS 2014). In particular, these algorithms employ a sophisticated interior-point method framework, while our algorithm is cast directly in the classic augmenting path setting that almost all the combinatorial maximum flow algorithms use. At a high level, the presented algorithm takes a primal dual approach in which each iteration uses electrical flows computations both to find an augmenting $s$-$t$ flow in the current residual graph and to update the dual solution. We show that by maintain certain careful coupling of these primal and dual solutions we are always guaranteed to make significant progress.