Influencia del potencial de polarizaci\'on en la deposici\'on de pel\'iculas delgadas de NiO

TL;DR

This study investigates how the polarization potential influences the deposition, structural properties, and electrical resistivity of NiO thin films produced by reactive sputtering under various voltage biases.

Contribution

It demonstrates the effect of applied voltage bias on residual stress, texture, and electrical resistivity of NiO thin films, highlighting the role of polarization potential in film properties.

Findings

Residual stress decreases at high biases.

(111) texture is promoted at high biases.

Electrical resistivity decreases with increasing bias.

Abstract

Nickel oxide (NiO) is a binary compound with a lot of applications in the present technology. NiO thin films were deposited by reactive sputtering magnetron under several voltage biases applied in the glass substrates (0, 50, 100, 200, 300, 400 and 500 V). Films were characterized by profilometry, X-ray diffraction, elemental composition and electrical resistivity at room temperature and at low temperatures. The present work showed that despite the insulating behavior of substrate the residual stress was reduced at high biases and the (111) texture was promoted. Electrical resistivity was reduced at high bias and at low temperatures thermal activation of p-type conduction was detected.