Effect of annealing on the interfacial Dzyaloshinskii-Moriya interaction in Ta/CoFeB/MgO trilayers
R. A. Khan, P. M. Shepley, A. Hrabec, A. W. J. Wells, B. Ocker, C. H., Marrows, T. A. Moore

TL;DR
This study investigates how annealing affects the interfacial Dzyaloshinskii-Moriya interaction in Ta/CoFeB/MgO trilayers, revealing a peak at 230°C linked to interfacial crystal ordering and B expulsion.
Contribution
It demonstrates that annealing can modulate the DMI in Ta/CoFeB/MgO, highlighting the relationship between annealing temperature, interfacial structure, and magnetic interactions.
Findings
DMI peaks at 230°C annealing temperature.
DMI and anisotropy fields follow similar trends with annealing.
Interfacial crystal ordering and B expulsion influence DMI behavior.
Abstract
The interfacial Dzyaloshinskii-Moriya interaction (DMI) has been shown to stabilize homochiral N\'eel-type domain walls in thin films with perpendicular magnetic anisotropy and as a result permit them to be propagated by a spin Hall torque. In this study, we demonstrate that in Ta/CoFeB/MgO the DMI may be influenced by annealing. We find that the DMI peaks at mJ/m at an annealing temperature of 230 C. DMI fields were measured using a purely field-driven creep regime domain expansion technique. The DMI field and the anisotropy field follow a similar trend as a function of annealing temperature. We infer that the behavior of the DMI and the anisotropy are related to interfacial crystal ordering and B expulsion out of the CoFeB layer as the annealing temperature is increased.
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