Infrared vertically-illuminated photodiode for chip alignment feedback
Luca Alloatti, Rajeev Jagga Ram

TL;DR
This paper presents vertically-illuminated photodiodes fabricated in a 45nm SOI process, capable of chip-to-chip alignment feedback at 1180 nm, with integrated processing for improved optical interconnects.
Contribution
It introduces a novel photodiode design and packaging for chip alignment feedback, integrating on-chip processing in a standard CMOS process.
Findings
Photodiodes responsive at 1180 nm suitable for chip communication
Wide field-of-view enables effective chip-to-board alignment
Monolithic integration allows on-chip processing of positional data
Abstract
We report on vertically-illuminated photodiodes fabricated in the GlobalFoundries 45nm 12SOI node and on a packaging concept for optically-interconnected chips. The photodiodes are responsive at 1180 nm, a wavelength currently used in chip-to-chip communications. They have further a wide field-of-view which enables chip-to-board positional feedback in chip-board assemblies. Monolithic integration enables on-chip processing of the positional data.
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