Schottky barrier and contact resistance of InSb nanowire field effect transistors
Dingxun Fan, N Kang, Sepideh Gorji Ghalamestani, Kimberly A Dick, H, Q Xu

TL;DR
This study investigates the electrical contact properties of InSb nanowire FETs with Ti/Au contacts, revealing a gate-tunable Schottky barrier of about 20 meV and magnetic field-dependent contact resistance, informing future nanoelectronic device design.
Contribution
It provides the first detailed experimental analysis of Schottky barriers and contact resistance behavior in InSb nanowire FETs with Ti/Au contacts, including magnetic field effects.
Findings
Schottky barrier height of ~20 meV at metal-InSb NW interface
Contact resistance increases with magnetic field after a threshold
Magnetic depopulation of subbands explains resistance behavior
Abstract
Understanding of the electrical contact properties of semiconductor nanowire (NW) field effect transistors (FETs) plays a crucial role in employing semiconducting NWs as building blocks for future nanoelectronic devices and in the study of fundamental physics problems. Here, we report on a study of the contact properties of Ti/Au, a widely used contact metal combination, to individual InSb NWs via both two-probe and four-probe transport measurements. We show that a Schottky barrier of height is present at the metal-InSb NW interfaces and its effective height is gate tunable. The contact resistance () in the InSb NWFETs is also analyzed by magnetotransport measurements at low temperatures. It is found that at on-state exhibits a pronounced magnetic field dependent feature, namely it is increased strongly with increasing magnetic…
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