Two competing interpretations of Kelvin Probe Force Microscopy on semiconductors put to test
Leo Polak, Rinke J. Wijngaarden

TL;DR
This paper compares two interpretations of Kelvin Probe Force Microscopy on semiconductors, demonstrating that the contact potential difference interpretation aligns with experimental results, while the BHS interpretation does not.
Contribution
The study provides a theoretical and experimental comparison of two KPFM interpretations, advocating for the CPD interpretation as the correct approach.
Findings
BHS predictions conflict with experimental data
CPD interpretation explains surface and material effects
BHS interpretation is inconsistent with observed voltage differences
Abstract
Kelvin probe force microscopy (KPFM) is a popular tool for studying properties of semiconductors. However, the interpretation of its results is complicated by the possibility of so-called band bending and the presence of surface charges. In this work we study two different interpretations for KPFM on semiconductors: the contact potential difference (CPD) interpretation, which interprets the measured potential as the work function difference between the sample and the probe, and a newer, alternative, interpretation proposed by Baumgart, Helm and Schmidt (BHS). By performing model calculations we demonstrate that these models generally lead to very different results. Hence it is important to decide which one is correct. We demonstrate that BHS predictions for the Kelvin voltage difference between the and parts of a -junction are inconsistent with a set of experimental results…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
