Pressure-induced gap closing and metallization of MoSe$_{2}$ and MoTe$_{2}$
Michaela Riflikov\'a, Roman Marto\v{n}\'ak, and Erio Tosatti

TL;DR
This study predicts that MoSe2 and MoTe2, layered semiconductors, become metallic under high pressure without structural phase transitions, with potential implications for their electronic properties and superconductivity.
Contribution
First principles calculations reveal pressure-induced metallization of MoSe2 and MoTe2 without structural phase change, extending understanding of their high-pressure behavior.
Findings
MoSe2 metallizes between 28-40 GPa
MoTe2 metallizes between 13-19 GPa
Both materials resist layer sliding up to 100 GPa
Abstract
Layered molybdenum dichalchogenides are semiconductors whose gap is controlled by delicate interlayer interactions. The gap tends to drop together with the interlayer distance, suggesting collapse and metallization under pressure. We predict, based on first principles calculations, that layered semiconductors 2H-MoSe and 2H-MoTe should undergo metallization at pressures between 28 and 40 GPa (MoSe) and 13 and 19 GPa (MoTe). Unlike MoS where a 2H 2H layer sliding transition is known to take place, these two materials appear to preserve the original 2H layered structure at least up to 100 GPa and to increasingly resist lubric layer sliding under pressure. Similar to metallized MoS they are predicted to exhibit a low density of states at the Fermi level, and presumably very modest superconducting temperatures if any. We also study the…
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