Diffusion of Rb atoms in paraffin - coated resonant vapor cells

TL;DR

This study investigates how rubidium atoms diffuse in paraffin-coated vapor cells, modeling the process and measuring the diffusion coefficient, which enhances understanding of atom-coating interactions relevant for quantum optics and atomic sensors.

Contribution

The paper provides a model of Rb atom diffusion in paraffin coatings and experimentally determines the diffusion coefficient, offering new insights into atom-coating interactions in vapor cells.

Findings

Diffusion coefficient of Rb in paraffin: 4.7×10^-7 cm^2/s

Atomic density increases with coating thickness

Main Rb loss due to absorption by glass substrate

Abstract

We present the results of a study of the diffusion of Rb atoms in paraffin - coated resonant vapor cells. We have modeled the Rb diffusion both in the cell and in the coating, assuming that the main loss of Rb atoms is due to the physical absorption of the atoms by the glass substrate. It is demonstrated that the equilibrium atomic density in the cell is a monotonic function of the thickness of the paraffin coating: the density increases with an increase in the thickness of the coating. The diffusion coefficient for rubidium in paraffin thin films has been determined to be equal to 4,7*10^-7 cm^2/s. The results of the experiment might be useful for a better understanding of the details involved in the processes of the interaction of alkali atoms with a paraffin coating.