Optical nano artifact metrics using silicon random nanostructures
Tsutomu Matsumoto, Naoki Yoshida, Shumpei Nishio, Morihisa Hoga,, Yasuyuki Ohyagi, Naoya Tate, and Makoto Naruse

TL;DR
This paper introduces an optical method using confocal laser microscopy to characterize silicon nanostructures for secure authentication, offering a low-cost alternative to electron microscopy with high nanoscale precision.
Contribution
It demonstrates a novel optical approach for nano artifact metrics utilizing silicon random nanostructures, enabling secure, high-precision identification without expensive equipment.
Findings
Confocal laser microscopy achieves nanoscale height measurement precision.
Silicon nanostructures can be reliably cloned and distinguished.
Statistical analysis confirms security potential of the nanostructure signatures.
Abstract
Nano artifact metrics exploit unique physical attributes of nanostructured matter for authentication and clone resistance, which is vitally important in the age of Internet-of-Things where securing identities is critical. However, high-cost and huge experimental apparatuses, such as scanning electron microscopy, have been required in the former studies. Herein, we demonstrate an optical approach to characterise the nanoscale-precision signatures of silicon random structures towards realising low-cost and high-value information security technology. Unique and versatile silicon nanostructures are generated via resist collapse phenomena, which contains dimensions that are well below the diffraction limit of light. We exploit the nanoscale precision ability of confocal laser microscopy in the height dimension, and our experimental results demonstrate that the vertical precision of…
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Taxonomy
TopicsPhysical Unclonable Functions (PUFs) and Hardware Security · Advanced Memory and Neural Computing · Integrated Circuits and Semiconductor Failure Analysis
