Tailoring reflection of graphene plasmons by focused ion beams

TL;DR

This paper demonstrates how focused ion beams can precisely control the reflection of graphene plasmons, enabling advanced manipulation for integrated photonic devices.

Contribution

It introduces a novel method of using ion beam etching to tailor graphene plasmon reflection properties with high precision.

Findings

Ion beam etching modifies plasmon reflection boundaries.

Proper ion dose achieves natural-like reflection boundaries.

Ion beam incident angle influences plasmon reflection behavior.

Abstract

Graphene plasmons are of remarkable features that make graphene plasmon elements promising for applications to integrated photonic devices. The fabrication of graphene plasmon components and control over plasmon propagating are of fundamental important. Through near-field plasmon imaging, we demonstrate controllable modifying of the reflection of graphene plasmon at boundaries etched by ion beams. Moreover, by varying ion dose at a proper value, nature like reflection boundary can be obtained. We also investigate the influence of ion beam incident angle on plasmon reflection. To illustrate the application of ion beam etching, a simple graphene wedge-shape plasmon structure is fabricated and performs excellently, proving this technology as a simple and efficient tool for controlling graphene plasmons.