Indium segregation during III-V quantum wire and quantum dot formation on patterned substrates
Stefano T. Moroni, Valeria Dimastrodonato, Tung-Hsun Chung, Gediminas, Juska, Agnieszka Gocalinska, Dimitri D. Vvedensky, Emanuele Pelucchi

TL;DR
This paper develops a reaction-diffusion model for the epitaxial growth of InGaAs nanostructures on non-planar substrates, explaining facet-dependent kinetics and growth outcomes, including quantum wire and dot formation.
Contribution
It introduces a comprehensive kinetic model for III-V nanostructure growth on patterned substrates, incorporating facet-dependent processes and explaining experimental observations.
Findings
Model accurately predicts InGaAs nanostructure growth on non-planar surfaces.
Identifies facet-dependent kinetic parameters for InGaAs epitaxy.
Reveals new facetting phenomena at pyramidal recesses facilitating quantum dot formation.
Abstract
We report a model for metalorganic vapor-phase epitaxy on non-planar substrates, specifically V-grooves and pyramidal recesses, which we apply to the growth of InGaAs nanostructures. This model, based on a set of coupled reaction-diffusion equations, one for each facet in the system, accounts for the facet-dependence of all kinetic processes (e.g., precursor decomposition, adatom diffusion, and adatom lifetimes) and has been previously applied to account for the temperature, concentration, and temporal-dependence of AlGaAs nanostructures on GaAs (111)B surfaces with V-grooves and pyramidal recesses. In the present study, the growth of InGaAs quantum wires at the bottom of V-grooves is used to determine a set of optimized kinetic parameters. Based on these parameters, we have modeled the growth of InGaAs nanostructures formed in pyramidal…
Peer Reviews
No public reviews on file for this paper yet. If you reviewed it on a platform where reviews are public (OpenReview, ICLR, NeurIPS, ICML), you can paste yours below so the community can read it here.
Videos
No videos yet. Explain this paper in a talk, walkthrough, or lecture? Add one.
