Exploring the electron density in plasma induced by EUV radiation: II. Numerical studies in argon and hydrogen

TL;DR

This paper uses numerical modeling to analyze EUV-induced plasma in argon and hydrogen, comparing simulations with experimental measurements to understand how setup parameters influence plasma characteristics.

Contribution

It provides a detailed numerical study of EUV-induced plasma evolution in argon and hydrogen, highlighting the effects of geometry, spectrum, and secondary emission.

Findings

Measured electron densities reflect plasma amount in the cavity

Setup geometry and EUV spectrum affect plasma generation

Secondary emission impacts electron density measurements

Abstract

We used numerical modeling to study the evolution of EUV-induced plasmas in argon and hydrogen. The results of simulations were compared to the electron densities measured by microwave cavity resonance spectroscopy. It was found that the measured electron densities can be used to derive the integral amount of plasma in the cavity. However, in some regimes, the impact of the setup geometry, EUV spectrum, and EUV induced secondary emission should be taken into account. The influence of these parameters on the generated plasma and the measured electron density is discussed.