The effect of Ta oxygen scavenger layer on HfO$_2$-based resistive switching behavior: thermodynamic stability, electronic structure, and low-bias transport
X. Zhong, I. Rungger, P. Zapol, H. Nakamura, Y. Asai, and O. Heinonen

TL;DR
This study uses density functional theory to analyze how a Ta oxygen scavenger layer affects the thermodynamic stability, electronic structure, and low-bias transport in HfO₂-based resistive switching devices, revealing mechanisms for performance enhancement.
Contribution
It provides a fundamental understanding of how Ta scavenger layers modify heterostructure properties, improving device performance and stability in resistive memory applications.
Findings
Ta insertion lowers formation energy of low-resistance states
Ta layer reduces Schottky barrier height in high-resistance state
Conductance becomes less sensitive to oxygen distribution with Ta layer
Abstract
Reversible resistive switching between high-resistance and low-resistance states in metal-oxide-metal heterostructures makes them very interesting for applications in random access memories. While recent experimental work has shown that inserting a metallic "oxygen scavenger layer" between the positive electrode and oxide improves device performance, the fundamental understanding of how the scavenger layer modifies heterostructure properties is lacking. We use density functional theory to calculate thermodynamic properties and conductance of TiN/HfO/TiN heterostructures with and without Ta scavenger layer. First, we show that Ta insertion lowers the formation energy of low-resistance states. Second, while the Ta scavenger layer reduces the Schottky barrier height in the high-resistance state by modifying the interface charge at the oxide-electrode interface, the heterostructure…
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