Observation of large spin accumulation voltages in non-degenerate Si spin devices due to spin drift effect: Experiments and theory
Takayuki Tahara (1), Yuichiro Ando (1), Makoto Kameno (2), Hayato, Koike (3), Kazuhito Tanaka (2), Shinji Miwa (2), Yoshishige Suzuki (2),, Tomoyuki Sasaki (3), Tohru Oikawa (3), Masashi Shiraishi (1), (2) ((1) Kyoto, Univ., (2) Osaka Univ., (3) TDK Co.)

TL;DR
This study reports the largest spin-accumulation voltage in non-degenerate silicon spin devices at room temperature, explained by a modified spin drift-diffusion model highlighting the impact of spin drift effects on magnetoresistance.
Contribution
The paper introduces a modified spin drift-diffusion model that accurately explains large spin voltages and bias dependence in silicon-based lateral spin valves, advancing understanding of spin transport.
Findings
Measured spin-accumulation voltage exceeds 1.5 mV at 1 mA.
The modified model accounts for bias-current-polarity dependence.
Spin drift effect enhances magnetoresistance in two-terminal schemes.
Abstract
A large spin-accumulation voltage of more than 1.5 mV at 1 mA, i.e., a magnetoresistance of 1.5 {\Omega}, was measured by means of the local three-terminal magnetoresistance in nondegenerate Si-based lateral spin valves (LSVs) at room temperature. This is the largest spin-accumulation voltage measured in semiconductor-based LSVs. The modified spin drift-diffusion model, which successfully accounts for the spin drift effect, explains the large spin-accumulation voltage and significant bias-current-polarity dependence. The model also shows that the spin drift effect enhances the spin-dependent magnetoresistance in the electric two terminal scheme. This finding provides a useful guiding principle for spin metal-oxide semiconductor field-effect transistor (MOSFET) operations.
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