Chemical assembly of atomically thin transistors and circuits in a large scale
Mervin Zhao, Yu Ye, Yimo Han, Yang Xia, Hanyu Zhu, Yuan Wang, David A., Muller, Xiang Zhang

TL;DR
This paper demonstrates a scalable chemical method to assemble 2D heterostructures of MoS2 and graphene, enabling high-performance atomic transistors and logic circuits for advanced electronics.
Contribution
It introduces a large-scale, site-selective synthesis technique for 2D heterostructures, advancing the integration of atomic thin materials in electronic devices.
Findings
High transconductance (10 μS) achieved in 2D transistors
On-off ratio of 10^6 demonstrated in devices
Heterostructure NMOS inverter with gain up to 70
Abstract
Next-generation electronics calls for new materials beyond silicon for increased functionality, performance, and scaling in integrated circuits. Carbon nanotubes and semiconductor nanowires are at the forefront of these materials, but have challenges due to the complex fabrication techniques required for large-scale applications. Two-dimensional (2D) gapless graphene and semiconducting transition metal dichalcogenides (TMDCs) have emerged as promising electronic materials due to their atomic thickness, chemical stability and scalability. Difficulties in the assembly of 2D electronic structures arise in the precise spatial control over the metallic and semiconducting atomic thin films. Ultimately, this impedes the maturity of integrating atomic elements in modern electronics. Here, we report the large-scale spatially controlled synthesis of the single-layer semiconductor molybdenum…
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Taxonomy
TopicsElectronic and Structural Properties of Oxides · Advanced Memory and Neural Computing · Molecular Junctions and Nanostructures
