Prospects of Zero Schottky Barrier Height in a Graphene Inserted MoS2-Metal Interface
Anuja Chanana, Santanu Mahapatra

TL;DR
This study uses density functional theory to investigate how inserting graphene between metals and MoS2 affects Schottky barrier heights, revealing that the effect varies with different metals and can potentially lead to ohmic contacts.
Contribution
It provides detailed atomistic insights into the charge transfer and electronic structure changes caused by graphene insertion at MoS2-metal interfaces, highlighting the importance of metal choice.
Findings
Graphene insertion reduces SBH for some metals but increases it for Au and Pt.
Projected dispersion of MoS2 remains preserved with graphene insertion.
Proper metal selection (e.g., Ru) can achieve ohmic contact in graphene-inserted interfaces.
Abstract
A low Schottky barrier height (SBH) at source/drain contact is essential for achieving high drive current in atomic layer MoS2 channel based field-effect transistors. Approaches such as choosing metals with appropriate work functions and chemical doping are employed previously to improve the carrier injection from the contact electrodes to the channel and to mitigates the SBH between the MoS2 and metal. Recent experiments demonstrate significant SBH reduction when graphene layer is inserted between metal slab (Ti and Ni) and MoS2. However, the physical or chemical origin of this phenomenon is not yet clearly understood. In this work, density functional theory (DFT) simulations are performed, employing pseudopotentials with very high basis sets to get insights of the charge transfer between metal and monolayer MoS2 through the inserted graphene layer. Our atomistic simulations on 16…
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