Interface control by homoepitaxial growth in pulsed laser deposited iron chalcogenide thin ilms

TL;DR

This study demonstrates that using a FeSe$_{1-x}$Te$_x$ seed layer significantly improves the epitaxial growth and superconducting properties of FeSe$_{1-x}$Te$_x$ thin films on MgO substrates via pulsed laser deposition, despite lattice mismatch challenges.

Contribution

Introduction of a seed layer technique to enhance homoepitaxial growth and superconducting properties of iron chalcogenide thin films on MgO substrates.

Findings

Reproducible high critical temperatures (≥17 K) achieved.

Effective growth at reduced deposition temperatures (200-320°C).

Improved epitaxial quality despite lattice mismatch.

Abstract

Thin film growth of iron chalcogenides by pulsed laser deposition (PLD) is still a delicate issue in terms of simultaneous control of stoichiometry, texture, substrate/film interface properties, and superconducting properties. The high volatility of the constituents sharply limits optimal deposition temperatures to a narrow window and mainly challenges reproducibility for vacuum based methods. In this work we demonstrate the beneficial introduction of a semiconducting FeSe$_{1\text{--}x}$Te$_x$ seed layer for subsequent homoepitaxial growth of superconducting FeSe$_{1\text{--}x}$Te$_x$ thin film on MgO substrates. MgO is one of the most favorable substrates used in superconducting thin film applications, but the controlled growth of iron chalcogenide thin films on MgO has not yet been optimized and is the least understood. The large mismatch between the lattice constants of MgO and FeSe$_{1\text{--}x}$Te$_x$ of about 11% results in thin films with a mixed texture, that prevents further accurate investigations of a correlation between structural and electrical properties of FeSe$_{1\text{--}x}$Te$_x$. Here we present an effective way to significantly improve epitaxial growth of superconducting FeSe$_{1\text{--}x}$Te$_x$ thin films with reproducible high critical temperatures ($\geq$ 17 K) at reduced deposition temperatures (200 {\deg}C - 320 {\deg}C) on MgO using PLD. This offers a broad scope of various applications.