Molecular beam epitaxy growth of SrO buffer layers on graphite and graphene for the integration of complex oxides
Adam Ahmed, Hua Wen, Taisuke Ohta, Igor Pinchuk, Tiancong Zhu, Thomas, Beechem, Roland Kawakami

TL;DR
This paper demonstrates the successful growth of high-quality SrO buffer layers on graphite and graphene using molecular beam epitaxy, enabling integration of complex oxides like SrTiO3 with 2D materials.
Contribution
It introduces a method for growing oriented SrO films on graphite and graphene, facilitating complex oxide integration on 2D materials.
Findings
SrO films are (001) oriented with smooth, pinhole-free surfaces.
Transport measurements show a strong dependence of graphene's Dirac point on Sr oxidation.
SrTiO3 can be grown atop SrO/graphite stacks, demonstrating oxide integration.
Abstract
We report the successful growth of high-quality SrO films on highly-ordered pyrolytic graphite (HOPG) and single-layer graphene by molecular beam epitaxy. The SrO layers have (001) orientation as confirmed by x-ray diffraction (XRD) while atomic force microscopy measurements show continuous pinhole-free films having rms surface roughness of <1.5 {\AA}. Transport measurements of exfoliated graphene after SrO deposition show a strong dependence between the Dirac point and Sr oxidation. Subsequently, the SrO is leveraged as a buffer layer for more complex oxide integration via the demonstration of (001) oriented SrTiO3 grown atop a SrO/HOPG stack.
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