Band bending at interfaces between topological insulator Bi2Se3 and transition metals
Weiguang Ye, A. B. Pakhomov, Shuigang Xu, Huanhuan Lu, Zefei Wu, Yu, Han, Tianyi Han, Yingying Wu, Gen Long, Jiangxiazi Lin, Gu Xu, Yuan Cai,, Lu-Tao Weng, Ning Wang

TL;DR
This study investigates the electronic and chemical properties of interfaces between topological insulator Bi2Se3 and transition metals, revealing band bending effects that impact potential spintronic device applications.
Contribution
It demonstrates that clean, chemically stable interfaces can be formed with ultrathin transition metal layers and uncovers significant band bending phenomena near the interface.
Findings
Achieved chemically clean interfaces with 1 nm metal layers
Observed depletion or inversion of charge carriers near the interface
Detected strong band bending affecting surface state properties
Abstract
Interfaces between exfoliated topological insulator Bi2Se3 and several transition metals deposited by sputtering were studied by XPS, SIMS, UPS and contact I-V measurements. Chemically clean interfaces can be achieved when coating Bi2Se3 with a transition metal layer as thin as 1 nm, even without capping. Most interestingly, UPS spectra suggest depletion or inversion in the originally n-type topological insulator near the interface. Strong band bending in the topological insulator requires careful material engineering or electric biasing if one desires to make use of the spin locking in surface states in the bulk gap for potential spintronic applications
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Taxonomy
TopicsTopological Materials and Phenomena · Diamond and Carbon-based Materials Research · Graphene research and applications
