Comparison of the luminous efficiency of Ga- and N-polar In$_{x}$Ga$_{1-x}$N/In$_{y}$Ga$_{1-y}$N quantum wells grown by plasma-assisted molecular beam epitaxy
Sergio Fern\'andez-Garrido, Jonas L\"ahnemann, Christian Hauswald,, Maxim Korytov, Martin Albrecht, Caroline Ch\`eze, Czes{\l}aw Skierbiszewski,, Oliver Brandt

TL;DR
This study compares the luminescence efficiency of Ga- and N-polar InGaN quantum wells grown by plasma-assisted molecular beam epitaxy, revealing that N-polar wells do not emit light from the wells themselves but from defect-related facets.
Contribution
It demonstrates that N-polar InGaN quantum wells exhibit nonradiative defect-related luminescence from v-pit facets, challenging their suitability for long-wavelength LEDs.
Findings
N-polar QWs on freestanding GaN show no detectable photoluminescence.
Luminescence in N-polar QWs on 6H-SiC originates from v-pit facets, not the QWs.
Ga-polar QWs show quantum confined Stark effect with increasing well width.
Abstract
We investigate the luminescence of Ga- and N-polar InGaN/InGaN quantum wells (QWs) grown by plasma-assisted molecular beam epitaxy on freestanding GaN as well as 6H-SiC substrates. In striking contrast to their Ga-polar counterparts, the N-polar QWs prepared on freestanding GaN do not exhibit any detectable photoluminescence. Theoretical simulations of the band profiles combined with resonant excitation of the QWs allow us to rule out carrier escape and subsequent surface recombination as the reason for the absence of luminescence. To explore the hypothesis of a high concentration of nonradiative defects at the interfaces between wells and barriers, we analyze Ga- and N-polar QWs prepared on 6H-SiC as a function of the well width. Intense luminescence is observed for both Ga- and N polar samples. As expected, the luminescence of the Ga-polar QWs quenches and…
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