In-operando synchronous time-multiplexed O K-edge x-ray absorption spectromicroscopy of functioning tantalum oxide memristors
Suhas Kumar, Catherine E. Graves, John Paul Strachan, A. L. David, Kilcoyne, Tolek Tyliszczak, Yoshio Nishi, R. Stanley Williams

TL;DR
This study introduces a time-multiplexed x-ray spectromicroscopy technique to investigate the atomic and electronic changes in functioning tantalum oxide memristors, revealing nanoscale dynamics during conductance switching and device aging.
Contribution
The paper presents a novel spatially and spectrally resolved spectromicroscopy method for studying weak and localized oxide modifications in memristors during operation.
Findings
Uniform spectral changes during initial switching
Lateral motion of oxygen agglomerates after cycling
Localized relaxation behavior under electrical stimuli
Abstract
Memristors are receiving keen interest because of their potential varied applications and promising large-scale information storage capabilities. Tantalum oxide is a memristive material that has shown promise for high-performance nonvolatile computer memory. The microphysics has been elusive because of the small scale and subtle physical changes that accompany conductance switching. In this study, we probed the atomic composition, local chemistry and electronic structure of functioning tantalum oxide memristors through spatially mapped O K-edge x-ray absorption. We developed a time-multiplexed spectromicroscopy technique to enhance the weak and possibly localized oxide modifications with spatial and spectral resolutions of <30 nm and 70 meV, respectively. During the initial stages of conductance switching of a micrometer sized crosspoint device, the spectral changes were uniform within…
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