Wafer-scale growth of large arrays of perovskite microplate crystals for functional electronics and optoelectronics

TL;DR

This paper demonstrates the first patterned growth of perovskite microplate arrays on wafer-scale, enabling their use in integrated electronics and optoelectronics with high crystalline quality and precise placement.

Contribution

It introduces a novel seeded growth process for large, patterned arrays of perovskite microplates suitable for device integration.

Findings

Successful wafer-scale patterned growth of perovskite microplates

High-quality crystalline and optical properties of the grown microplates

Demonstration of functional devices like photodetectors and transistors

Abstract

Methylammonium lead iodide perovskite has attracted intensive interest for its diverse optoelectronic applications. However, most studies to date have been limited to bulk thin films that are difficult to implement for integrated device arrays because of their incompatibility with typical lithography processes. We report the first patterned growth of regular arrays of perovskite microplate crystals for functional electronics and optoelectronics. We show that large arrays of lead iodide microplates can be grown from an aqueous solution through a seeded growth process and can be further intercalated with methylammonium iodide to produce perovskite crystals. Structural and optical characterizations demonstrate that the resulting materials display excellent crystalline quality and optical properties. We further show that perovskite crystals can be selectively grown on prepatterned electrode arrays to create independently addressable photodetector arrays and functional field effect transistors. The ability to grow perovskite microplates and to precisely place them at specific locations offers a new material platform for the fundamental investigation of the electronic and optical properties of perovskite materials and opens a pathway for integrated electronic and optoelectronic systems.