Ambipolar High Mobility Hexagonal Transistors on Hydrogen-Terminated Silicon (111) Surfaces
Binhui Hu, Mohamad M. Yazdanpanah, Joyce E. Coppock, and B. E. Kane

TL;DR
This paper reports the fabrication and characterization of ambipolar high-mobility hexagonal transistors on hydrogen-terminated Si(111) surfaces, demonstrating tunable electron and hole systems, high mobilities, and quantum Hall effects with symmetry analysis.
Contribution
The work introduces ambipolar transistors on Si(111) with high mobility and explores their symmetry and quantum Hall phenomena, a novel approach for silicon-based 2D systems.
Findings
Achieved electron and hole densities up to ~7.8×10^{11} cm^{-2}
Observed high electron mobility of 1.76×10^5 cm^2/Vs at 300 mK
Detected fractional quantum Hall states at high magnetic fields
Abstract
We have fabricated ambipolar transistors on chemically prepared hydrogen-terminated Si(111) surfaces, in which a two-dimensional electron system (2DES) or a two-dimensional hole system (2DHS) can be populated in the same conduction channel by changing the gate voltage of a global gate applied through a vacuum gap. Depending on the gate bias, ion implanted n and p regions function either as Ohmic contacts or as in-plane gates, which laterally confine the carriers induced by the global gate. On one device, electron and hole densities of up to cm and cm respectively are obtained. The peak electron mobility is cm/Vs, and the peak hole mobility is cm/Vs at 300 mK; the ratio of about 20 is mainly due to the very different valley degeneracies (6:1) of electrons and holes on the Si(111)…
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Taxonomy
TopicsQuantum and electron transport phenomena · Surface and Thin Film Phenomena · Semiconductor materials and devices
