Influence of ionisation zone motion in high power impulse magnetron sputtering on angular ion flux and NbO$_x$ film growth
Robert Franz, C\'esar Clavero, Jonathan Kolbeck, and Andr\'e Anders

TL;DR
This study investigates how ionisation zone motion in high power impulse magnetron sputtering affects angular ion flux and NbO$_x$ film growth, revealing asymmetries linked to plasma dynamics and film properties.
Contribution
It provides the first detailed analysis of angular ion flux asymmetries and their impact on NbO$_x$ film growth in HiPIMS, highlighting the role of ionisation zone motion.
Findings
Positively charged ion fluxes are higher in the $+ extbf{E} imes extbf{B}$ direction.
NbO$_x$ film thickness and composition vary with deposition angle.
Ionisation zone motion influences ion energies and film growth conditions.
Abstract
The ion energies and fluxes in the high power impulse magnetron sputtering plasma from a Nb target were analysed angularly resolved along the tangential direction of the racetrack. A reactive oxygen-containing atmosphere was used as such discharge conditions are typically employed for the synthesis of thin films. Asymmetries in the flux distribution of the recorded ions as well as their energies and charge states were noticed when varying the angle between mass-energy analyser and target surface. More positively charged ions with higher count rates in the medium energy range of their distributions were detected in than in direction, thus confirming the notion that ionisation zones (also known as spokes or plasma bunches) are associated with moving potential humps. The motion of the recorded negatively charged high-energy…
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