Ion irradiation effects on a magnetic Si/Ni/Si trilayer and lateral magnetic-nonmagnetic multistrip patterning by focused ion beam
B. N. Dev, N. Banu, J. Fassbender, J. Grenzer, N. Schell, L.Bischoff,, R.Groetzschel, J. McCord

TL;DR
This study investigates how focused ion beam irradiation modifies the magnetic properties of a Si/Ni/Si trilayer, enabling the creation of patterned magnetic/nonmagnetic multistrip structures with controllable ferromagnetism and domain interactions.
Contribution
It demonstrates the use of FIB irradiation to selectively alter magnetic properties and form multistrip patterns, revealing stress-induced anisotropy effects in the process.
Findings
Ferromagnetism is lost at a specific ion fluence due to Si incorporation.
Patterned stripes exhibit interacting magnetic domains contrary to shape anisotropy expectations.
Stress-induced anisotropy explains the observed magnetic behavior across stripes.
Abstract
Fabrication of a multistrip magnetic/nonmagnetic structure in a thin sandwiched Ni layer [Si(5 nm)/Ni(10 nm)/Si] by a focused ion beam (FIB) irradiation has been attempted. A control experiment was initially performed by irradiation with a standard 30 keV Ga ion beam at various fluences. Analyses were carried out by Rutherford backscattering spectrometry, X-ray reflectivity, magnetooptical Kerr effect (MOKE) measurements and MOKE microscopy. With increasing ion fluence, the coercivity as well as Kerr rotation decreases. A threshold ion fluence has been identified, where ferromagnetism of the Ni layer is lost at room temperature and due to Si incorporation into the Ni layer, a Ni0.68Si0.32 alloy layer is formed. This fluence was used in FIB irradiation of parallel 50 nm wide stripes, leaving 1 micrometer wide unirradiated stripes in between. MOKE microscopy on this FIB-patterned sample…
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Taxonomy
TopicsMicrostructure and mechanical properties · Ion-surface interactions and analysis · Magnetic properties of thin films
