Lamellar Diblock Copolymers on Rough Substrates: Self-consistent Field Theory Studies
Xingkun Man, Jiuzhou Tang, Pan Zhou, Dadong Yan, and David Andelman

TL;DR
This study uses self-consistent field theory to analyze how substrate roughness influences the orientation of lamellar diblock copolymers, revealing conditions that favor perpendicular alignment for nanolithography applications.
Contribution
It provides a quantitative analysis of the critical substrate roughness needed for lamellar orientation transition, considering surface preference, film thickness, and polymer parameters.
Findings
Critical roughness increases with surface preference and film thickness.
Rough substrates can induce perpendicular lamellae even with surface preference.
Results align with experimental observations and inform nanolithography techniques.
Abstract
We present numerical calculations of lamellar phases of di-block copolymers (BCP) confined between two surfaces, where the top surface is flat and the bottom one is corrugated. The corrugated substrate is assumed to have a single -mode of lateral undulations with a wavenumber q_s and amplitude R. We focus on the effects of substrate roughness, parameterized by the dimensionless quantity, q_sR, on the relative stability between parallel and perpendicular orientations of the lamellar phase. The competition between film confinement, energy cost of elastic deformation and gain in surface energy induces a parallel-to-perpendicular transition of the BCP lamellae. Employing self-consistent field theory (SCFT), we study the critical substrate roughness value corresponding to this transition. The critical value increases as function of the surface preference towards one of the two BCP…
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